Sivan Lachman-Shalem

Sivan received her BSc and MSc degrees from the Chemical Engineering Faculty at the Technion, in 1996 and 2000 respectively. In 1997 she won, in collaboration of her peers, the IMI annual award for an outstanding engineering achievement. Her research interests include process control and semiconductor manufacturing.

Her MSc research involved the application of MBPCA to the failure diagnosis of NMOS manufacturing. Currently, she is part of the team working on the implementation of NMPC on the control of a photolothography track, sponsored by the WFCM (Wafer Fab Cluster Management)  Consortium.

Research Associate
Chemical Engineering 372
Tel. +972-4-8293560
Fax. +972-4-8295672
sivanls@techunix.technion.ac.il